In semiconductor production, controlling ionic contamination is essential for achieving high yields and device reliability. Even a few ppb of ionic impurities in ultra-pure water, etching chemicals, or rinsing solutions can lead to surface defects and product failure.
Ion Chromatography (IC) provides accurate and sensitive determination of both anions and cations, making it the preferred analytical technique for process water, chemical baths, and material quality control.
1. Recommended IC System Configuration
| Component | Specification | Purpose |
| Pump | Dual-piston high-pressure pump (0.001–10 mL/min) | Stable eluent flow |
| Suppressor | Chemical or electrolytic type | Reduce background conductivity |
| Detector | Conductivity detector (standard), optional UV or MS | Sensitive ion detection |
| Column | Anion & cation exchange columns | Separation of ionic species |
| Autosampler | 120-position tray | Continuous analysis |
| Software | Automated calibration and ion balance analysis | Data accuracy & compliance |
This configuration features low detection limits and excellent repeatability, supporting continuous unattended operation, which is crucial for semiconductor manufacturing plants and materials testing laboratories.
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